Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum

标题
Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum
作者
关键词
-
出版物
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 6, Pages H652
出版商
The Electrochemical Society
发表日期
2010-05-04
DOI
10.1149/1.3377003

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