The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD

Title
The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 12, Issue 10, Pages D80
Publisher
The Electrochemical Society
Online
2009-08-14
DOI
10.1149/1.3191715

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