In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

(2011) Kaupo Kukli et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Mechanism, Products, and Growth Rate of Atomic Layer Deposition of Noble Metals

(2010) Simon D. Elliott   LANGMUIR

Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements

(2010) H. Wojcik et al.   MICROELECTRONIC ENGINEERING

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

(2008) Sung-Soo Yim et al.   JOURNAL OF APPLIED PHYSICS

Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD

(2008) S. Strehle et al.   MICROELECTRONIC ENGINEERING

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

(2008) Sang-Joon Park et al.   THIN SOLID FILMS

Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin films

(2007) D. Schmidt et al.   MICROELECTRONIC ENGINEERING

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING