Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms

Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms

(2012) E. V. Johnson et al.   APPLIED PHYSICS LETTERS

Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring

(2012) E.V. Johnson et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms

(2012) T Lafleur et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films

(2012) A. C. Bronneberg et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ion energy distribution measurements in rf and pulsed dc plasma discharges

(2012) D Gahan et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique

(2012) D. Hrunski et al.   VACUUM

Nanocrystalline silicon film growth morphology control through RF waveform tailoring

(2010) Erik V Johnson et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

(2009) J Schulze et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric

(2008) Brian G Heil et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect

(2008) Z Donkó et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS