Resistive switching mechanisms relating to oxygen vacancies migration in both interfaces in Ti/HfOx/Pt memory devices
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Title
Resistive switching mechanisms relating to oxygen vacancies migration in both interfaces in Ti/HfOx/Pt memory devices
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 113, Issue 6, Pages 064510
Publisher
AIP Publishing
Online
2013-02-15
DOI
10.1063/1.4791695
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Related references
Note: Only part of the references are listed.- In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy
- (2012) Thomas Bertaud et al. APPLIED PHYSICS LETTERS
- Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures
- (2012) M. Sowinska et al. APPLIED PHYSICS LETTERS
- Defect engineering: reduction effect of hydrogen atom impurities in HfO2-based resistive-switching memory devices
- (2012) Seonghyun Kim et al. NANOTECHNOLOGY
- Transport properties of HfO2−xbased resistive-switching memories
- (2012) Zhongrui Wang et al. PHYSICAL REVIEW B
- Metal–Oxide RRAM
- (2012) H.-S. Philip Wong et al. PROCEEDINGS OF THE IEEE
- Resistive Switching Behavior and Multiple Transmittance States in Solution-Processed Tungsten Oxide
- (2011) Wei-Ting Wu et al. ACS Applied Materials & Interfaces
- Schottky Barrier Mediated Single-Polarity Resistive Switching in Pt Layer-Included TiOx Memory Device
- (2011) Yu-Lung Chung et al. ACS Applied Materials & Interfaces
- Anatomy of a Nanoscale Conduction Channel Reveals the Mechanism of a High-Performance Memristor
- (2011) Feng Miao et al. ADVANCED MATERIALS
- Understanding the intermediate initial state in TiO2−δ/La2/3Sr1/3MnO3 stack-based bipolar resistive switching devices
- (2011) Y. S. Chen et al. APPLIED PHYSICS LETTERS
- Observation of two resistance switching modes in TiO2memristive devices electroformed at low current
- (2011) Feng Miao et al. NANOTECHNOLOGY
- Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook
- (2011) Kyung Min Kim et al. NANOTECHNOLOGY
- Resistive switching of HfO2-based Metal–Insulator–Metal diodes: Impact of the top electrode material
- (2011) T. Bertaud et al. THIN SOLID FILMS
- Controllable Growth of Nanoscale Conductive Filaments in Solid-Electrolyte-Based ReRAM by Using a Metal Nanocrystal Covered Bottom Electrode
- (2010) Qi Liu et al. ACS Nano
- Interface-Engineered Amorphous TiO2-Based Resistive Memory Devices
- (2010) Hu Young Jeong et al. ADVANCED FUNCTIONAL MATERIALS
- Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
- (2010) Hu Young Jeong et al. APPLIED PHYSICS LETTERS
- Transition of stable rectification to resistive-switching in Ti/TiO2/Pt oxide diode
- (2010) Jiun-Jia Huang et al. APPLIED PHYSICS LETTERS
- Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
- (2010) Deok-Hwang Kwon et al. Nature Nanotechnology
- Electronic structure of Pt/HfO2 interface with oxygen vacancy
- (2009) Eunae Cho et al. MICROELECTRONIC ENGINEERING
- Fully Room-Temperature-Fabricated Nonvolatile Resistive Memory for Ultrafast and High-Density Memory Application
- (2009) Yu Chao Yang et al. NANO LETTERS
- The mechanism of electroforming of metal oxide memristive switches
- (2009) J Joshua Yang et al. NANOTECHNOLOGY
- X-ray photoelectron spectroscopic analysis of HfSiON thin films
- (2008) Lulu Zhang et al. SURFACE AND INTERFACE ANALYSIS
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