Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures
Published 2012 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 100, Issue 23, Pages 233509
Publisher
AIP Publishing
Online
2012-06-08
DOI
10.1063/1.4728118
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- A Monte Carlo study of the low resistance state retention of HfOx based resistive switching memory
- (2012) Shimeng Yu et al. APPLIED PHYSICS LETTERS
- Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure
- (2011) T. Nagata et al. APPLIED PHYSICS LETTERS
- Impact of Temperature on the Resistive Switching Behavior of Embedded $\hbox{HfO}_{2}$-Based RRAM Devices
- (2011) Christian Walczyk et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Origin of resistivity change in NiO thin films studied by hard x-ray photoelectron spectroscopy
- (2011) P. Calka et al. JOURNAL OF APPLIED PHYSICS
- Magnetometry of buried layers—Linear magnetic dichroism and spin detection in angular resolved hard X-ray photoelectron spectroscopy
- (2011) Andrei Gloskovskii et al. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
- Resistive switching characteristics of CMOS embedded HfO2-based 1T1R cells
- (2011) D. Walczyk et al. MICROELECTRONIC ENGINEERING
- Resistive switching of HfO2-based Metal–Insulator–Metal diodes: Impact of the top electrode material
- (2011) T. Bertaud et al. THIN SOLID FILMS
- Interfacial oxygen and nitrogen induced dipole formation and vacancy passivation for increased effective work functions in TiN/HfO2 gate stacks
- (2010) C. L. Hinkle et al. APPLIED PHYSICS LETTERS
- Impact of Engineered Ti Layer on the Memory Performance of HfO[sub x]-Based Resistive Memory
- (2010) Pang-Shiu Chen et al. ELECTROCHEMICAL AND SOLID STATE LETTERS
- An Ultrathin Forming-Free $\hbox{HfO}_{x}$ Resistance Memory With Excellent Electrical Performance
- (2010) Yu-Sheng Chen et al. IEEE ELECTRON DEVICE LETTERS
- Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges
- (2009) Rainer Waser et al. ADVANCED MATERIALS
- Bipolar resistive switching behavior in Ti/MnO2/Pt structure for nonvolatile memory devices
- (2009) Min Kyu Yang et al. APPLIED PHYSICS LETTERS
- Pulse-induced low-power resistive switching in HfO2 metal-insulator-metal diodes for nonvolatile memory applications
- (2009) Ch. Walczyk et al. JOURNAL OF APPLIED PHYSICS
- Influence of the electrode material on HfO[sub 2] metal-insulator-metal capacitors
- (2009) Ch. Wenger et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
- The mechanism of electroforming of metal oxide memristive switches
- (2009) J Joshua Yang et al. NANOTECHNOLOGY
- Resistive switching in transition metal oxides
- (2008) Akihito Sawa Materials Today
Add your recorded webinar
Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.
Upload NowBecome a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get Started