In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy
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Title
In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 101, Issue 14, Pages 143501
Publisher
AIP Publishing
Online
2012-10-02
DOI
10.1063/1.4756897
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