Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films

A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films

(2014) Eunjin Kim et al.   ADVANCED FUNCTIONAL MATERIALS

Interfacial Design for Block Copolymer Thin Films

(2014) Michael J. Maher et al.   CHEMISTRY OF MATERIALS

Unidirectional Alignment of Block Copolymer Films Induced by Expansion of a Permeable Elastomer during Solvent Vapor Annealing

(2014) Zhe Qiang et al.   MACROMOLECULES

Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

(2014) Justin G. Kennemur et al.   MACROMOLECULES

Photopatternable Interfaces for Block Copolymer Lithography

(2014) Michael J. Maher et al.   ACS Macro Letters

Orientation Control of Block Copolymer Thin Films Placed on Ordered Nanoparticle Monolayers

(2013) Taehee Kim et al.   MACROMOLECULES

Dynamic Thermal Field-Induced Gradient Soft-Shear for Highly Oriented Block Copolymer Thin Films

(2012) Gurpreet Singh et al.   ACS Nano

Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains

(2012) C. M. Bates et al.   SCIENCE

Alignment of perpendicular lamellae in block copolymer thin films by shearing

(2012) Saswati Pujari et al.   Soft Matter

Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

(2011) Jeong Gon Son et al.   NANO LETTERS

Highly Tunable Self-Assembled Nanostructures from a Poly(2-vinylpyridine-b-dimethylsiloxane) Block Copolymer

(2011) Jae Won Jeong et al.   NANO LETTERS

Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography

(2010) Eungnak Han et al.   ACS Nano

Integration of Density Multiplication in the Formation of Device-Oriented Structures by Directed Assembly of Block Copolymer-Homopolymer Blends

(2010) Guoliang Liu et al.   ADVANCED FUNCTIONAL MATERIALS

Hierarchical Nanostructures by Sequential Self-Assembly of Styrene-Dimethylsiloxane Block Copolymers of Different Periods

(2010) Jeong Gon Son et al.   ADVANCED MATERIALS

A Path to Ultranarrow Patterns Using Self-Assembled Lithography

(2010) Yeon Sik Jung et al.   NANO LETTERS

Complex self-assembled patterns using sparse commensurate templates with locally varying motifs

(2010) Joel K. W. Yang et al.   Nature Nanotechnology

Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer

(2009) Joan K. Bosworth et al.   ACS Nano

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

(2009) Joona Bang et al.   ADVANCED MATERIALS

Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

(2009) Ho-Cheol Kim et al.   CHEMICAL REVIEWS

One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces

(2009) Dong Ok Shin et al.   MACROMOLECULES

Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement

(2009) Seong-Jun Jeong et al.   NANO LETTERS