Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer

Published 2009 View Full Article

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Title
Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer
Authors
Keywords
-
Journal
ACS Nano
Volume 3, Issue 7, Pages 1761-1766
Publisher
American Chemical Society (ACS)
Online
2009-06-17
DOI
10.1021/nn900343u

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