HfO2/TiO2/HfO2 tri-layer high-K gate oxide based MoS2 negative capacitance FET with steep subthreshold swing
出版年份 2020 全文链接
标题
HfO2/TiO2/HfO2 tri-layer high-K gate oxide based MoS2 negative capacitance FET with steep subthreshold swing
作者
关键词
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出版物
AIP Advances
Volume 10, Issue 3, Pages 035202
出版商
AIP Publishing
发表日期
2020-03-02
DOI
10.1063/1.5143939
参考文献
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