Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
出版年份 2019 全文链接
标题
Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
作者
关键词
-
出版物
Scientific Reports
Volume 9, Issue 1, Pages -
出版商
Springer Science and Business Media LLC
发表日期
2019-07-18
DOI
10.1038/s41598-019-47049-z
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