Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition

标题
Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 6, Issue 9, Pages 6731-6738
出版商
American Chemical Society (ACS)
发表日期
2014-04-09
DOI
10.1021/am500458d

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