A low-leakage and high-writable SRAM cell with back-gate biasing in FinFET technology

标题
A low-leakage and high-writable SRAM cell with back-gate biasing in FinFET technology
作者
关键词
SRAM, Leakage, FinFET, Dynamic back-gate biasing, Process variations
出版物
Journal of Computational Electronics
Volume -, Issue -, Pages -
出版商
Springer Nature
发表日期
2019-03-29
DOI
10.1007/s10825-019-01327-1

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