Plasma-Enhanced Atomic Layer Deposition of TaCx Films Using Tris(neopentyl) Tantalum Dichloride and H2 Plasma

Plasma-Enhanced Atomic Layer Deposition of TaC[sub x]N[sub y] Films with tert-Butylimido Tris-diethylamido Tantalum and Methane/Hydrogen Gas

(2010) Gi-hee Cho et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC[sub x]N[sub y] Films Using tert-Butylimidotris(diethylamido)tantalum

(2010) Suk-Hoon Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Thermally stable high effective work function TaCN thin films for metal gate electrode applications

(2009) C. Adelmann et al.   JOURNAL OF APPLIED PHYSICS

Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films

(2009) C. Hossbach et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

(2008) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine

(2008) B. B. Burton et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia

(2008) Moon-Kyun Song et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS