Nucleation and Chemical Transformation of RuO2 Films Grown on (100) Si Substrates by Atomic Layer Deposition

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition

(2010) Seong Keun Kim et al.   CHEMISTRY OF MATERIALS

Mono-Energetic Neutron Source by 7Li(p,n)7Be Reaction

(2010) Kim gi Dong   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Influence of Catalyst Pretreatments on Propane Oxidation Over Ru/γ-Al2O3

(2009) Janina Okal et al.   CATALYSIS LETTERS

Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications

(2009) L. Wu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Texture of atomic layer deposited ruthenium

(2009) J. Musschoot et al.   MICROELECTRONIC ENGINEERING

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

(2008) Sung-Soo Yim et al.   JOURNAL OF APPLIED PHYSICS

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

(2008) Francisco Zaera   JOURNAL OF MATERIALS CHEMISTRY

Vapor phase deposition of copper films with a Cu(I) β-diketiminate precursor

(2008) Jeffery S. Thompson et al.   THIN SOLID FILMS