Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power

Pulsed plasma etching for semiconductor manufacturing

(2014) Demetre J Economou   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Kinetic modelling for an atmospheric pressure argon plasma jet in humid air

(2013) W Van Gaens et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Pulsed high-density plasmas for advanced dry etching processes

(2012) Samer Banna et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF4/O2

(2012) Sang-Heon Song et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Measurement of free radical kinetics in pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam mass spectrometry

(2012) G Cunge et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Analysis of pulsed high-density HBr and Cl2 plasmas: Impact of the pulsing parameters on the radical densities

(2011) P. Bodart et al.   JOURNAL OF APPLIED PHYSICS

Experiments and global model of inductively coupled rf Ar/N2 discharges

(2010) Takashi Kimura et al.   JOURNAL OF APPLIED PHYSICS

Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

(2009) Mark J Kushner   JOURNAL OF PHYSICS D-APPLIED PHYSICS