Pulsed plasma etching for semiconductor manufacturing

Published 2014 View Full Article

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Title
Pulsed plasma etching for semiconductor manufacturing
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 47, Issue 30, Pages 303001
Publisher
IOP Publishing
Online
2014-07-01
DOI
10.1088/0022-3727/47/30/303001

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