Pulsed high-density plasmas for advanced dry etching processes

Decreasing high ion energy during transition in pulsed inductively coupled plasmas

(2012) Ankur Agarwal et al.   APPLIED PHYSICS LETTERS

Transistor wars

(2011) Khaled Ahmed et al.   IEEE SPECTRUM

Tailoring Ion Energy Distributions Using Pulsed Plasmas

(2011) Ankur Agarwal et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Analysis of pulsed high-density HBr and Cl2 plasmas: Impact of the pulsing parameters on the radical densities

(2011) P. Bodart et al.   JOURNAL OF APPLIED PHYSICS

Recouping etch rates in pulsed inductively coupled plasmas

(2011) Ankur Agarwal et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge

(2010) G. Cunge et al.   APPLIED PHYSICS LETTERS

Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H2 and N2 mixture gases

(2010) Chang Sung Moon et al.   JOURNAL OF APPLIED PHYSICS

A global (volume averaged) model of a Cl2/Ar discharge: II. Pulsed power modulation

(2010) E G Thorsteinsson et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Radical surface interactions in industrial silicon plasma etch reactors

(2010) G Cunge et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession

(2010) T. Chiarella et al.   SOLID-STATE ELECTRONICS

Probing radical kinetics in the afterglow of pulsed discharges by absorption spectroscopy with light emitting diodes: Application to BCl radical

(2009) D. Vempaire et al.   APPLIED PHYSICS LETTERS

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

(2009) S. Banna et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

(2009) Ken Tokashiki et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Effect of simultaneous source and bias pulsing in inductively coupled plasma etching

(2009) Ankur Agarwal et al.   JOURNAL OF APPLIED PHYSICS

Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies

(2008) Ankur Agarwal et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A