High precision two-dimensional strain mapping in semiconductor devices using nanobeam electron diffraction in the transmission electron microscope

Title
High precision two-dimensional strain mapping in semiconductor devices using nanobeam electron diffraction in the transmission electron microscope
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 104, Issue 26, Pages 262102
Publisher
AIP Publishing
Online
2014-07-02
DOI
10.1063/1.4886137

Ask authors/readers for more resources

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now