Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Published 2009 View Full Article

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Title
Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 48, Issue 5, Pages 056508
Publisher
Japan Society of Applied Physics
Online
2009-05-20
DOI
10.1143/jjap.48.056508

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