Grain boundary assisted degradation and breakdown study in cerium oxide gate dielectric using scanning tunneling microscopy

Role of oxygen vacancies in HfO2-based gate stack breakdown

(2010) X. Wu et al.   APPLIED PHYSICS LETTERS

Modified Percolation Model for Polycrystalline High-$ \kappa$ Gate Stack With Grain Boundary Defects

(2010) Nagarajan Raghavan et al.   IEEE ELECTRON DEVICE LETTERS

The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2

(2009) Keith McKenna et al.   APPLIED PHYSICS LETTERS

First-principles calculations of defects near a grain boundary in MgO

(2009) K. P. McKenna et al.   PHYSICAL REVIEW B

Polarity dependent breakdown of the high-κ∕SiOx gate stack: A phenomenological explanation by scanning tunneling microscopy

(2008) D. S. Ang et al.   APPLIED PHYSICS LETTERS

The nature of dielectric breakdown

(2008) X. Li et al.   APPLIED PHYSICS LETTERS