The influence of sputtering power and O2/Ar flow ratio on the performance and stability of Hf–In–Zn–O thin film transistors under illumination

Title
The influence of sputtering power and O2/Ar flow ratio on the performance and stability of Hf–In–Zn–O thin film transistors under illumination
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 97, Issue 10, Pages 102103
Publisher
AIP Publishing
Online
2010-09-11
DOI
10.1063/1.3488823

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