Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness

Published 2010 View Full Article

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Title
Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 49, Issue 6, Pages 06GF05
Publisher
Japan Society of Applied Physics
Online
2010-06-21
DOI
10.1143/jjap.49.06gf05

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