4.5 Article

Step-Free GaN Hexagons Grown by Selective-Area Metalorganic Vapor Phase Epitaxy

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APPLIED PHYSICS EXPRESS
Volume 2, Issue 9, Pages -

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JAPAN SOCIETY APPLIED PHYSICS
DOI: 10.1143/APEX.2.091002

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Selective-area metalorganic vapor phase epitaxy of GaN has been investigated using the optimized growth conditions for the layer (Frankvan der Merwe) growth and GaN-template substrates with low dislocation density. The surface of a GaN hexagon with 16-mu m diameter has a single wide terrace over almost the whole area (step-free surface), when there are no screw-type dislocations in the finite area. Step-free GaN hexagons grew in the two-dimensional nucleus growth mode and had approximately an eight times lower growth rate than that of a GaN film grown in the step-flow mode under the growth conditions used in this study. (C) 2009 The Japan Society of Applied Physics

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