Enhanced effect of side-Ohmic contact processing on the 2DEG electron density and electron mobility of In0.17Al0.83N/AlN/GaN heterostructure field-effect transistors

Title
Enhanced effect of side-Ohmic contact processing on the 2DEG electron density and electron mobility of In0.17Al0.83N/AlN/GaN heterostructure field-effect transistors
Authors
Keywords
Barrier Layer, Rapid Thermal Annealing, Schottky Contact, Gate Bias, Contact Processing
Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 116, Issue 4, Pages 2065-2075
Publisher
Springer Nature
Online
2014-04-03
DOI
10.1007/s00339-014-8403-6

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