Influence of oxygen pressure on the ferroelectric properties of BiFeO3 thin films on LaNiO3/Si substrates via laser ablation

Published 2010 View Full Article

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Title
Influence of oxygen pressure on the ferroelectric properties of BiFeO3 thin films on LaNiO3/Si substrates via laser ablation
Authors
Keywords
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Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 101, Issue 4, Pages 651-654
Publisher
Springer Nature
Online
2010-07-20
DOI
10.1007/s00339-010-5918-3
References
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