Ferroelectricity in epitaxial Y-doped HfO2 thin film integrated on Si substrate
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Title
Ferroelectricity in epitaxial Y-doped HfO2 thin film integrated on Si substrate
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 112, Issue 20, Pages 202901
Publisher
AIP Publishing
Online
2018-05-14
DOI
10.1063/1.5020688
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- (2012) Johannes Muller et al. IEEE ELECTRON DEVICE LETTERS
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