The influence of anatase titanium dioxide film (0 0 1) preferred orientation on N implantation process

出版年份 2017 全文链接

标题

作者

关键词

N doped TiO, 2, Ion beam technology, Texture, XPS

出版物

Volume 197, Issue -, Pages 28-30

出版商

Elsevier BV

发表日期

2017-03-28

DOI

10.1016/j.matlet.2017.03.149

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