Growth of HfO2/TiO2nanolaminates by atomic layer deposition and HfO2-TiO2by atomic partial layer deposition

Structural and XPS studies of PSi/TiO2 nanocomposites prepared by ALD and Ag-assisted chemical etching

(2015) Igor Iatsunskyi et al.   APPLIED SURFACE SCIENCE

Aperture-time of oxygen-precursor for minimum silicon incorporation into the interface-layer in atomic layer deposition-grown HfO2/Si nanofilms

(2015) Pierre Giovanni Mani-Gonzalez et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Accounting for Nanometer-Thick Adventitious Carbon Contamination in X-ray Absorption Spectra of Carbon-Based Materials

(2014) Filippo Mangolini et al.   ANALYTICAL CHEMISTRY

Toward atomically-precise synthesis of supported bimetallic nanoparticles using atomic layer deposition

(2014) Junling Lu et al.   Nature Communications

Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Sc, Ti, V, Cu and Zn

(2010) Mark C. Biesinger et al.   APPLIED SURFACE SCIENCE

Atomic Layer Deposition of Ir−Pt Alloy Films

(2010) Steven T. Christensen et al.   CHEMISTRY OF MATERIALS

Comparative Study of Titanium Dioxide Atomic Layer Deposition on Silicon Dioxide and Hydrogen-Terminated Silicon

(2010) Rungthiwa Methaapanon et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol

(2009) Jian Liu et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

The use of nanolaminates to obtain structurally stable high-K films with superior electrical properties: HfNO–HfTiO

(2008) V. Mikhelashvili et al.   JOURNAL OF APPLIED PHYSICS

Comparative x-ray reflectometry and atomic force microscopy of surfaces with non-Gaussian roughness

(2008) V. L. Mironov et al.   JOURNAL OF APPLIED PHYSICS