Surface plasmon-assisted nano-lithography with a perfect contact aluminum mask of a hexagonal dot array

Period reduction lithography in normal UV range with surface plasmon polaritons interference and hyperbolic metamaterial multilayer structure

(2015) Fan Yang et al.   Applied Physics Express

Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens

(2015) Ping Gao et al.   APPLIED PHYSICS LETTERS

Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography

(2015) Patinharekandy Prabhathan et al.   OPTICAL ENGINEERING

Pushing the resolution of photolithography down to 15nm by surface plasmon interference

(2014) Jianjie Dong et al.   Scientific Reports

A detailed study of resonance-assisted evanescent interference lithography to create high aspect ratio, super-resolved structures

(2013) Prateek Mehrotra et al.   OPTICS EXPRESS

Effect of metals on UV-excited plasmonic lithography for sub-50 nm periodic feature fabrication

(2010) K. V. Sreekanth et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Breaking the feature sizes down to sub-22 nm by plasmonic interference lithography using dielectric-metal multilayer

(2009) Xuefeng Yang et al.   OPTICS EXPRESS

Fabrication of highly ordered, macroporous Na2W4O13 arrays by spray pyrolysis using polystyrene colloidal crystals as templates

(2009) SunHyung Lee et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The effect of photoresist contrast on the exposure profiles obtained with evanescent fields of nanoapertures

(2008) Eungman Lee et al.   JOURNAL OF APPLIED PHYSICS

193nm interference nanolithography based on SPP

(2008) Wei Xiong et al.   MICROELECTRONIC ENGINEERING

Optical and Magnetic Properties of Hexagonal Arrays of Subwavelength Holes in Optically Thin Cobalt Films

(2008) G. Ctistis et al.   NANO LETTERS

Investigation of high-resolution contact printing

(2007) B. Meliorisz et al.   MICROELECTRONIC ENGINEERING