Atomic layer deposition of diisopropylaminosilane on WO3(001) and W(110): a density functional theory study

Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2

(2015) Guo-Yong Fang et al.   CHEMICAL COMMUNICATIONS

Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

(2014) Ciaran A. Murray et al.   ACS Applied Materials & Interfaces

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

(2014) Matti Putkonen et al.   THIN SOLID FILMS

Adsorption and surface reaction of bis-diethylaminosilane as a Si precursor on an OH-terminated Si (001) surface

(2012) Seung-Bin Baek et al.   APPLIED SURFACE SCIENCE

Reactivity of hydrogen and methanol on (001) surfaces of WO3, ReO3, WO3/ReO3 and ReO3/WO3

(2011) Sanliang Ling et al.   CATALYSIS TODAY

Electronic and Structural Properties of WO3: A Systematic Hybrid DFT Study

(2011) Fenggong Wang et al.   Journal of Physical Chemistry C

A consistent and accurate ab initio parametrization of density functional dispersion correction (DFT-D) for the 94 elements H-Pu

(2010) Stefan Grimme et al.   JOURNAL OF CHEMICAL PHYSICS

Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

(2010) F. Hirose et al.   THIN SOLID FILMS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO2(001) Surface

(2009) Jiaye Li et al.   Journal of Physical Chemistry C

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Study of tungsten oxidation in O2∕H2∕N2 downstream plasma

(2008) Songlin Xu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A