Monodispersed mesoporous silica (mSiO2) spheres as abrasives for improved chemical mechanical planarization performance

Effects of non-spherical colloidal silica slurry on Al-NiP hard disk substrate CMP application

(2016) Sideq Salleh et al.   APPLIED SURFACE SCIENCE

Adsorption and desorption characteristics of DNA onto the surface of amino functional mesoporous silica with various particle morphologies

(2016) Ryouichi Hikosaka et al.   COLLOIDS AND SURFACES B-BIOINTERFACES

Polymer/CeO2–Fe3O4 multicomponent core–shell particles for high-efficiency magnetic-field-assisted polishing processes

(2016) Junji Murata et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Synthesis of spherical mesoporous silica materials by pseudomorphic transformation of silica fume and its Pb 2+ removal properties

(2016) Wenjie Zhu et al.   MICROPOROUS AND MESOPOROUS MATERIALS

Microstructural characteristics and elastic modulus of porous solids

(2015) Zhangwei Chen et al.   ACTA MATERIALIA

Chemical mechanical polishing of steel substrate using colloidal silica-based slurries

(2015) Liang Jiang et al.   APPLIED SURFACE SCIENCE

Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

(2015) Hua Gong et al.   APPLIED SURFACE SCIENCE

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

(2015) Li Xu et al.   APPLIED SURFACE SCIENCE

Electro-chemical mechanical polishing of single-crystal SiC using CeO 2 slurry

(2015) Hui Deng et al.   ELECTROCHEMISTRY COMMUNICATIONS

Polystyrene-Core Silica-Shell Composite Abrasives: The Influence of Core Size on Oxide Chemical Mechanical Planarization

(2015) Ailian Chen et al.   JOURNAL OF ELECTRONIC MATERIALS

Elucidating the Sorption Mechanism of Dibromomethane in Disordered Mesoporous Silica Adsorbents

(2015) Daniela Stoeckel et al.   LANGMUIR

Effect of lanthanum doping in ceria abrasives on chemical mechanical polishing selectivity for shallow trench isolation

(2015) B.V.S. Praveen et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Preparation of monodispersed mesoporous silica particles and their applications in adsorption of Au 3+ and Hg 2+ after mercapto-functionalized treatment

(2015) Xiying Li et al.   MICROPOROUS AND MESOPOROUS MATERIALS

Local densification of a single micron sized silica sphere by uniaxial compression

(2015) Stefan Romeis et al.   SCRIPTA MATERIALIA

Polymethylmethacrylate (PMMA)/CeO 2 hybrid particles for enhanced chemical mechanical polishing performance

(2015) Yang Chen et al.   TRIBOLOGY INTERNATIONAL

Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries

(2014) Uma Rames Krishna Lagudu et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Ultrasmooth Gold Surfaces Prepared by Chemical Mechanical Polishing for Applications in Nanoscience

(2014) Michael S. Miller et al.   LANGMUIR

Mechanical characterization of highly porous inorganic solids materials by instrumented micro-indentation

(2013) P. Clément et al.   ACTA MATERIALIA

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

(2013) Naresh K. Penta et al.   APPLIED SURFACE SCIENCE

Chemical mechanical polishing of thin film diamond

(2013) Evan L.H. Thomas et al.   CARBON

Bioresponsive Controlled Drug Release Based on Mesoporous Silica Nanoparticles Coated with Reductively Sheddable Polymer Shell

(2013) Baisong Chang et al.   CHEMISTRY OF MATERIALS

Silica composite nanoparticles containing fluorescent solid core and mesoporous shell with different thickness as drug carrier

(2013) Zhipeng Ran et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

Gold Nanorod@Chiral Mesoporous Silica Core–shell Nanoparticles with Unique Optical Properties

(2013) Wenjing Liu et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

The use of potassium peroxidisulphate and Oxone® as oxidizers for the chemical mechanical polishing of silicon wafers

(2013) A. Piñeiro et al.   WEAR

Modeling the effects of particle deformation in chemical mechanical polishing

(2012) Xiaochun Chen et al.   APPLIED SURFACE SCIENCE

Material removal mechanism during porous silica cluster impact on crystal silicon substrate studied by molecular dynamics simulation

(2012) Ruling Chen et al.   APPLIED SURFACE SCIENCE

Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing

(2012) Hyuk-Min Kim et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Polishing-activated nano α-Al2O3: Adsorption and electrochemical behavior toward organophosphate pesticides

(2012) Yan Wei et al.   ELECTROCHEMISTRY COMMUNICATIONS

The influence of abrasive particle size in copper chemical mechanical planarization

(2012) Kuo-Hsiu Wei et al.   SURFACE & COATINGS TECHNOLOGY

Preparation of porous Fe2O3/SiO2 nanocomposite abrasives and their chemical mechanical polishing behaviors on hard disk substrates

(2012) Hu Li et al.   THIN SOLID FILMS

Polishing behavior of PS/CeO2 hybrid microspheres with controlled shell thickness on silicon dioxide CMP

(2011) Yang Chen et al.   APPLIED SURFACE SCIENCE

Preparation of copper-incorporated mesoporous alumina abrasive and its CMP behavior on hard disk substrate

(2011) Hong Lei et al.   POWDER TECHNOLOGY

Preparation of porous alumina abrasives and their chemical mechanical polishing behavior

(2011) Hong Lei et al.   THIN SOLID FILMS

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

(2011) GuoShun Pan et al.   WEAR

Novel α-amine-functionalized silica-based dispersions for selectively polishing polysilicon and Si(100) over silicon dioxide, silicon nitride or copper during chemical mechanical polishing

(2010) P.R. Veera Dandu et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Study of Polishing Characteristics of Monodisperse Ceria Abrasive in Chemical Mechanical Planarization

(2010) Ji Chul Yang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Mechanical properties of hierarchical porous silica thin films: Experimental characterization by nanoindentation and Finite Element modeling

(2010) David Jauffrès et al.   MICROPOROUS AND MESOPOROUS MATERIALS

Engineering Polymer Core–Silica Shell Size in the Composite Abrasives for CMP Applications

(2008) S. Armini et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Composite Polymer Core–Silica Shell Abrasives: The Effect of the Shape of the Silica Particles on Oxide CMP

(2008) S. Armini et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY