Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy

Published 2010 View Full Article

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Title
Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy
Authors
Keywords
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Journal
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 56, Issue 4, Pages 1150-1155
Publisher
Korean Physical Society
Online
2010-04-15
DOI
10.3938/jkps.56.1150

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