4.8 Article

From Fully Strained to Relaxed: Epitaxial Ferroelectric Al1-xScxN for III-N Technology

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 32, Issue 21, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202109632

Keywords

aluminum-scandium-nitride (Al; (1-); Sc-x; N-x); epitaxial growth; ferroelectric; gallium nitride; semiconductors

Funding

  1. project ForMikro-SALSA from the Federal Ministry of Education and Research (BMBF) [16ES1053]
  2. Deutsche Forschungsgemeinschaft (DFG) under the scheme of the collaborative research center (CRC) 1261
  3. Deutsche Forschungsgemeinschaft (DFG) under the scheme of the collaborative research center (CRC) 1461
  4. Projekt DEAL

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This paper presents the first in-depth structural and electrical characterization of all-epitaxial, all-wurtzite-type ferroelectric III-N semiconductor heterostructures. The results show that Al1-xScxN films have multiple strain states and exhibit splitting of the ferroelectric displacement current into separate peaks. It is also observed that films grown on the metal-polar GaN template feature an initial multidomain state.
The recent emergence of wurtzite-type nitride ferroelectrics such as Al1-xScxN has paved the way for the introduction of all-epitaxial, all-wurtzite-type ferroelectric III-N semiconductor heterostructures. This paper presents the first in-depth structural and electrical characterization of such an epitaxial heterostructure by investigating sputter deposited Al1-xScxN solid solutions with x between 0.19 and 0.28 grown over doped n-GaN. The results of detailed structural investigations on the strain state and the initial unit-cell polarity with the peculiarities observed in the ferroelectric response are correlated. Among these, a Sc-content dependent splitting of the ferroelectric displacement current into separate peaks, which can be correlated with the presence of multiple strain states in the Al1-xScxN films is discussed. Unlike in previously reported studies on ferroelectric Al1-xScxN, all films thicker than 30 nm grown on the metal (M)-polar GaN template feature an initial multidomain state. The results support that regions with opposed polarities in as-grown films do not result as a direct consequence of the in-plane strain distribution, but are rather mediated by the competition between M-polar epitaxial growth on an M-polar template and a deposition process that favors nitrogen (N)-polar growth.

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