Defect-mediated sputtering process of boron nitride during high incident angle low-energy ion bombardment
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Title
Defect-mediated sputtering process of boron nitride during high incident angle low-energy ion bombardment
Authors
Keywords
Secondary ion mass spectrometry, Molecular dynamics, Sputtering, Boron nitride, 2D materials
Journal
MEASUREMENT
Volume 179, Issue -, Pages 109487
Publisher
Elsevier BV
Online
2021-04-27
DOI
10.1016/j.measurement.2021.109487
References
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