Defect-mediated sputtering process of boron nitride during high incident angle low-energy ion bombardment

标题
Defect-mediated sputtering process of boron nitride during high incident angle low-energy ion bombardment
作者
关键词
Secondary ion mass spectrometry, Molecular dynamics, Sputtering, Boron nitride, 2D materials
出版物
MEASUREMENT
Volume 179, Issue -, Pages 109487
出版商
Elsevier BV
发表日期
2021-04-27
DOI
10.1016/j.measurement.2021.109487

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started