4.6 Article

On the exceptional temperature stability of ferroelectric Al1-xScxN thin films

Journal

APPLIED PHYSICS LETTERS
Volume 118, Issue 23, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0053649

Keywords

-

Funding

  1. Federal Ministry of Education and Research (BMBF) [16ES1053]
  2. Deutsche Forschungsgemeinschaft (DFG) under the scheme of the Collaborative Research Center [(CRC)1261]
  3. German Science Foundation (DFG) [AM 105/40-1]
  4. GibsSchule-Stiftung
  5. Carl-Zeiss-Stiftung (project SCHARF)

Ask authors/readers for more resources

This study found that the ferroelectric-to-paraelectric transition temperature of Al1-xScxN thin film can exceed 1100 degrees C, surpassing the transition temperature of virtually any other thin film ferroelectric. Through high-temperature X-ray diffraction and permittivity measurements, it was discovered that the wurtzite-type structure of Al0.73Sc0.27N remains stable during the entire 1100 degrees C annealing cycle.
Through its dependence on low symmetry crystal phases, ferroelectricity is inherently a property tied to the lower temperature ranges of the phase diagram for a given material. This paper presents conclusive evidence that in the case of ferroelectric Al1-xScxN, low temperature has to be seen as a purely relative term, since its ferroelectric-to-paraelectric transition temperature is confirmed to surpass 1100 degrees C and thus the transition temperature of virtually any other thin film ferroelectric. We arrived at this conclusion through investigating the structural stability of 0.4-2 mu m thick Al0.73Sc0.27N films grown on Mo bottom electrodes via in situ high-temperature x-ray diffraction and permittivity measurements. Our studies reveal that the wurtzite-type structure of Al0.73Sc0.27N is conserved during the entire 1100 degrees C annealing cycle, apparent through a constant c/a lattice parameter ratio. In situ permittivity measurements performed up to 1000 degrees C strongly support this conclusion and include what could be the onset of a diverging permittivity only at the very upper end of the measurement interval. Our in situ measurements are well-supported by ex situ (scanning) transmission electron microscopy and polarization and capacity hysteresis measurements. These results confirm the structural stability on the sub-mu m scale next to the stability of the inscribed polarization during the complete 1100 degrees C annealing treatment. Thus, Al1-xScxN, there is the first readily available thin film ferroelectric with a temperature stability that surpasses virtually all thermal budgets occurring in microtechnology, be it during fabrication or the lifetime of a device-even in harshest environments.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

Article Materials Science, Multidisciplinary

Ultrathin Al1-xScxN for Low-Voltage-Driven Ferroelectric-Based Devices

Georg Schoenweger, Md Redwanul Islam, Niklas Wolff, Adrian Petraru, Lorenz Kienle, Hermann Kohlstedt, Simon Fichtner

Summary: This letter reports on room temperature switchable ultra-thin (10 nm) ferroelectric Al0.72Sc0.28N films, which are important for potential applications in neuromorphic computing and memory devices. All-epitaxial Al0.72Sc0.28N/Pt heterostructures are grown by magnetron sputtering, and the Al0.72Sc0.28N film surface is protected by in situ Pt capping to avoid oxidation. The films exhibit good epitaxy and show only moderate scaling effects in terms of relative permittivity and coercive field dependence, suggesting that the critical thickness for ferroelectricity has not yet been reached.

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS (2023)

Article Nanoscience & Nanotechnology

Thermal Stability of the Ferroelectric Properties in 100 nm-Thick

Roberto Guido, Patrick D. Lomenzo, Md Redwanul Islam, Niklas Wolff, Maike Gremmel, Georg Schoenweger, Hermann Kohlstedt, Lorenz Kienle, Thomas Mikolajick, Simon Fichtner, Uwe Schroeder

Summary: The discovery of ferroelectricity in aluminum scandium nitride (Al1-xScxN) shows potential for technological applications in harsh environments and space-related memory applications. The high-temperature stability of piezoelectricity in aluminum nitride enhances the viability of this material. Through a combination of electrical and in-situ X-ray diffraction measurements, as well as transmission electron microscopy and energy-dispersive X-ray spectroscopy, the ferroelectric and material properties of 100 nm-thick Al0.72Sc0.28N have been studied up to 873 K. The findings demonstrate that Al0.72Sc0.28N can achieve high switching polarization and tunable coercive fields within a temperature range of 375 K from room temperature to 673 K.

ACS APPLIED MATERIALS & INTERFACES (2023)

Article Chemistry, Physical

Nitrogen-doped NiCo2O4 nanowires on carbon paper as a self-supported air cathode for rechargeable Zn-air batteries

He Li, Sadegh Askari, Jihao Wang, Niklas Wolff, Malte Behrens, Lorenz Kienle, Jan Benedikt

Summary: A noble-metal-free bifunctional electrocatalyst was developed through a facile strategy for rechargeable zinc-air batteries. The nitrogen-doped NiCo2O4 nanostructures on carbon paper exhibited enhanced electrocatalytic activities for oxygen evolution and reduction reactions. The plasma treatment optimized the N doping process without changing the morphology and specific surface area of the catalyst. The resulting air cathode showed improved stability and performance compared to noble-metal catalyst counterparts.

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY (2023)

Article Chemistry, Multidisciplinary

Synthesis and Nanostructure Investigation of Hybrid β-Ga2O3/ZnGa2O4 Nanocomposite Networks with Narrow-Band Green Luminescence and High Initial Electrochemical Capacity

Niklas Wolff, Tudor Braniste, Helge Krueger, Sebastian Mangelsen, Redwanul Islam, Ulrich Schuermann, Lena M. Saure, Fabian Schuett, Sandra Hansen, Huayna Terraschke, Rainer Adelung, Ion Tiginyanu, Lorenz Kienle

Summary: This paper presents the synthesis and structural characterization of a hybrid beta-Ga2O3/ZnGa2O4 nanocomposite aero-network. Structural investigations reveal the transformation of the precursor aero-GaN(ZnO) network into hollow architectures composed of beta-Ga2O3 and ZnGa2O4 nanocrystals. The hybrid nanocomposite network demonstrates narrow band green light emission of ZnGa2O4 under UV light excitation and shows high initial capacities and exceptional rate performance for electrochemical applications.

SMALL (2023)

Article Nanoscience & Nanotechnology

A Comparative Study of Pt/Al0.72Sc0.28N/Pt-Based Thin-Film Metal-Ferroelectric-Metal Capacitors on GaN and Si Substrates

Md Redwanul Islam, Georg Schoenweger, Niklas Wolff, Adrian Petraru, Hermann Kohlstedt, Simon Fichtner, Lorenz Kienle

Summary: In this study, the structural and electrical properties of Al0.72Sc0.28N thin films grown on different substrates were compared. It was found that using an epitaxial Pt electrode layer on a GaN/Al2O3 substrate significantly improved the leakage current and coercive field of the material. Furthermore, an all-epitaxial Al0.72Sc0.28N/Pt/GaN stack with a sharp interface thickness of less than 1 nm was demonstrated.

ACS APPLIED MATERIALS & INTERFACES (2023)

Article Physics, Applied

Influence of Si(111) substrate off-cut on AlN film crystallinity grown by magnetron sputter epitaxy

Katrin Pingen, Stefan Neuhaus, Niklas Wolff, Lorenz Kienle, Agne Zukauskaite, Elizabeth von Hauff, Alexander M. Hinz

Summary: The increasing demand for More than Moore devices requires epitaxy technology to keep up with the discovery and deployment of new semiconductors. An emerging technology for cost-effective, device-quality growth is magnetron sputter epitaxy, though detailed studies on the process itself remain scarce.

JOURNAL OF APPLIED PHYSICS (2023)

Article Chemistry, Multidisciplinary

In-Grain Ferroelectric Switching in Sub-5 nm Thin Al0.74Sc0.26N Films at 1 V

Georg Schoenweger, Niklas Wolff, Md Redwanul Islam, Maike Gremmel, Adrian Petraru, Lorenz Kienle, Hermann Kohlstedt, Simon Fichtner

Summary: This study investigates the ferroelectric switching characteristics of sub-5 nm thin Al0.74Sc0.26N films grown on different substrates. Significant progress has been made compared to previous wurtzite-type ferroelectrics, including record low switching voltages of 1 V, larger coercive field to breakdown field ratio on silicon substrates, and the first demonstration of true ferroelectric domains in wurtzite-type materials on the atomic scale. These findings pave the way for achieving analog switching necessary for neuromorphic computing in highly scaled devices.

ADVANCED SCIENCE (2023)

No Data Available