Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment
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Title
Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment
Authors
Keywords
Atomic layer deposition, Titanium tetrachloride, Titanium dioxide thin film, Mass spectrometry, RBS, Film crystallinity, Morphology
Journal
BRAZILIAN JOURNAL OF PHYSICS
Volume 46, Issue 1, Pages 56-69
Publisher
Springer Nature
Online
2015-11-10
DOI
10.1007/s13538-015-0383-2
References
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