Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Mask-absorber optimization: the next phase

(2020) Claire van Lare et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

(2018)   Journal of Micro-Nanolithography MEMS and MOEMS

Advanced EUV mask and imaging modeling

(2017) Peter Evanschitzky et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Investigation of alternative absorbers for extreme ultraviolet mask blanks

(2017) Yohei Ikebe et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks

(2017) Stuart Sherwin et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

(2017) Vicky Philipsen et al.   Journal of Micro-Nanolithography MEMS and MOEMS

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

(2017) Jan van Schoot et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

(2016) Andreas Erdmann et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node

(2015) Michael Yeung et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning

(2013) Jae Uk Lee et al.   Applied Physics Express