Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node

Published 2015 View Full Article

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Title
Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 54, Issue 6S1, Pages 06FN01
Publisher
Japan Society of Applied Physics
Online
2015-04-20
DOI
10.7567/jjap.54.06fn01

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