A simple way to investigate the temperature of film growth surface during sputtering process

Sol–gel synthesis and optical properties of titanium dioxide thin film

(2018) Irfan Ullah et al.   MODERN PHYSICS LETTERS B

Effect of growth temperatures on the surface morphology, optical analysis, dielectric constants, electric susceptibility, Urbach and bandgap energy of sprayed NiO thin films

(2018) Alaa A. Akl et al.   OPTIK

The influence of anatase titanium dioxide film (0 0 1) preferred orientation on N implantation process

(2017) Jindong Liu et al.   MATERIALS LETTERS

The use of segmented cathodes to determine the spoke current density distribution in high power impulse magnetron sputtering plasmas

(2015) Phitsanu Poolcharuansin et al.   JOURNAL OF APPLIED PHYSICS

Simulation and experimental research on the substrate temperature distribution in HFCVD diamond film growth on the inner hole surface

(2013) Xinchang Wang et al.   SURFACE & COATINGS TECHNOLOGY

The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

(2012) Qing Wang et al.   PLASMA SCIENCE & TECHNOLOGY

Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

(2011) Prabitha B. Nair et al.   APPLIED SURFACE SCIENCE

Temperature behaviour of the substrate surface during growth of nanocrystalline silicon carbide films by deposition of 120 eV carbon and silicon ions

(2010) A.V. Semenov et al.   VACUUM

Study of the effect of plasma current density on the formation of titanium nitride and titanium oxynitride thin films prepared by reactive DC magnetron sputtering

(2009) P.K. Barhai et al.   VACUUM

Influence of direct current power on the photocatalytic activity of facing target sputtered TiO2 thin films

(2008) M.F. Hossain et al.   THIN SOLID FILMS