Bipolar HiPIMS for tailoring ion energies in thin film deposition

标题
Bipolar HiPIMS for tailoring ion energies in thin film deposition
作者
关键词
HiPIMS, Sputtering, Plasma
出版物
SURFACE & COATINGS TECHNOLOGY
Volume 359, Issue -, Pages 433-437
出版商
Elsevier BV
发表日期
2018-12-27
DOI
10.1016/j.surfcoat.2018.12.090

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