Fractal and statistical characterization of Ti thin films deposited by RF-magnetron sputtering: The effects of deposition time

Surface properties of Ti thin films prepared via radio frequency (RF) magnetron sputtering at various deposition times are investigated by fractal analyze. Structural and optical properties of deposited layers are characterized by XRD and UV vis. Crystallography study indicated that structure of Ti layers is formed in amorphous phase, without any related peaks to crystal planes in XRD patterns. Transparency of samples decreased with increase in deposition time, because different deposition time (10, 15 and 20 min) make varying thickness layers (401, 420 and 450 nm). Statistical and fractal properties of layers surface are studied over area of 2.2 mu m x 2.2 mu m by images obtained from AFM. The obtained results demonstrate that fractal dimension and statistical parameters are functions of deposition time. So that, fractal dimension and surface isotropy are increased with increase in deposition time, but the number of motifs and functional parameters are decreased.