Fractal and statistical characterization of Ti thin films deposited by RF-magnetron sputtering: The effects of deposition time

出版年份 2018 全文链接

标题

作者

关键词

Ti thin film, Sputtering, Fractal, Surface morphology, AFM

出版物

Volume 178, Issue -, Pages 231-242

出版商

Elsevier BV

发表日期

2018-10-10

DOI

10.1016/j.ijleo.2018.10.050

联系作者

Discuss science. Find collaborators. Network.

Join a conversation

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now