Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
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Title
Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
Authors
Keywords
Plasma-enhanced Atomic Layer Deposition, Atomic Layer Deposition, Nickel Oxide, Thin Film, Bis(ethylcyclopentadienyl)-nickel
Journal
KOREAN JOURNAL OF CHEMICAL ENGINEERING
Volume 35, Issue 12, Pages 2474-2479
Publisher
Springer Nature
Online
2018-11-20
DOI
10.1007/s11814-018-0179-5
References
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