Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

(2018) Maximilian Gebhard et al.   ACS Applied Materials & Interfaces

Si micro-cantilever sensor chips for space-resolved stress measurements in physical and plasma-enhanced chemical vapour deposition

(2018) Dario Grochla et al.   SENSORS AND ACTUATORS A-PHYSICAL

Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

(2017) Chad M. Huard et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

(2016) Jan Trieschmann et al.   Plasma Processes and Polymers

Film Stress of Amorphous Hydrogenated Carbon on Biaxially Oriented Polyethylene Terephthalate

(2015) Hendrik Bahre et al.   Plasma Processes and Polymers

The Multipole Resonance Probe: Progression and Evaluation of a Process Compatible Plasma Sensor

(2014) Christian Schulz et al.   IEEE SENSORS JOURNAL

Study on electrostatic and electromagnetic probes operated in ceramic and metallic depositing plasmas

(2014) T Styrnoll et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Time- and space-resolved high-throughput characterization of stresses during sputtering and thermal processing of Al–Cr–N thin films

(2013) D Grochla et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

(2013) T Styrnoll et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor

(2013) Kirsten Bobzin et al.   SURFACE & COATINGS TECHNOLOGY

The multipole resonance probe: characterization of a prototype

(2011) Martin Lapke et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

The origin of stresses in magnetron-sputtered thin films with zone T structures

(2010) R. Daniel et al.   ACTA MATERIALIA

An open source, parallel DSMC code for rarefied gas flows in arbitrary geometries

(2010) T.J. Scanlon et al.   COMPUTERS & FLUIDS

Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process

(2010) R. P. Cardoso et al.   JOURNAL OF APPLIED PHYSICS

Modeling and Simulation of Fast Neutral Beam Sources for Materials Processing

(2009) Demetre J. Economou   Plasma Processes and Polymers

The multipole resonance probe: A concept for simultaneous determination of plasma density, electron temperature, and collision rate in low-pressure plasmas

(2008) M. Lapke et al.   APPLIED PHYSICS LETTERS

Optimised Plasma Absorption Probe for the Electron Density Determination in Reactive Plasmas

(2008) Christian Scharwitz et al.   Plasma Processes and Polymers