Scratch formation and its mechanism in chemical mechanical planarization (CMP)
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Title
Scratch formation and its mechanism in chemical mechanical planarization (CMP)
Authors
Keywords
Chemical mechanical planarization (CMP), defects, scratch, post-CMP cleaning, defect source
Journal
Friction
Volume 1, Issue 4, Pages 279-305
Publisher
Springer Nature
Online
2013-11-14
DOI
10.1007/s40544-013-0026-y
References
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Related references
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