Study of Interface Charge Densities for ZrO2and HfO2Based Metal-Oxide-Semiconductor Devices

Title
Study of Interface Charge Densities for ZrO2and HfO2Based Metal-Oxide-Semiconductor Devices
Authors
Keywords
-
Journal
Advances in Materials Science and Engineering
Volume 2014, Issue -, Pages 1-6
Publisher
Hindawi Limited
Online
2014-08-21
DOI
10.1155/2014/497274

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