Nanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region

Title
Nanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region
Authors
Keywords
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Journal
Optical Materials Express
Volume 2, Issue 12, Pages 1743
Publisher
The Optical Society
Online
2012-11-08
DOI
10.1364/ome.2.001743

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