Nanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region

标题
Nanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region
作者
关键词
-
出版物
Optical Materials Express
Volume 2, Issue 12, Pages 1743
出版商
The Optical Society
发表日期
2012-11-08
DOI
10.1364/ome.2.001743

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